Atomic-Scale AES-EELS Analysis of Structure-Phase State and Growth Mechanism of Layered Nanostructures

A review of our experience in range of electron spectroscopy of the physical vapor-phase deposition and growth of single- and multilayer nanostructures with atomic scale interfaces is presented. The foundation of an innovative methodology for the combined AES-EELS analysis of layered nanostructures is developed. The methodology includes: 1) determination of the composition, thickness, and the mechanism of phase transitions in nanocoatings under the probing depth most appropriated for the range of film thickness 1 - 10 ML; 2) quantitative iteration Auger-analysis of the composition, thickness and growth mechanism of nanocoating; 3) structural and phase analysis of nanocoatings with use of the analysis of position, shape and energy of the plasmon EELS peak and with subtracting the contribution from the substrate; 4) analysis of phase transitions with use of the shift of the plasmon Auger-satellite and 5) non-destructive profiling of the composition of nanocoatings over depth with use of a dependence of the intensity and energy of EELS peaks on the value of the primary electron energy.